Xuemei Wang

(SENTECH Instruments GmbH)


Plasma enhanced chemical vapor deposition (PECVD) and plasma enhanced atomic layer deposition (PEALD) in advanced thin film processing

Categories: keynote@ICTF-2023

Short bio

Dr. Xuemei Wang is a Senior Application Engineer at SENTECH Instruments GmbH (based in Berlin, Germany) since 2011. Xuemei graduated as a Materials Scientist (Master of Eng.) from Tianjin University, China, in 2002. In 2007 she was awarded a Dr.-Ing. in Materials Science at Ruhr University Bochum, Germany, working on “Thin Functional Plasma Polymer and Metal/Plasma Polymer Nanocomposite Films” at Max Planck Institute for Iron Research GmbH in Duesseldorf in Germany.
Her current activity at SENTECH focuses on thin film deposition using Plasma Enhanced Chemical Vapor Deposition (PECVD) and Plasma Enhanced Atomic Layer Deposition (PEALD).